EHD Induced PVA Film Patterning and Its Applications for Microstructure Fabrication on Glass Substrate Surface

doi:10.19491/j.issn.1001-9278.2021.06.009

Abstract

Abstract:

In this study， a new strategy was proposed to fabricate various columnar microstructures on the glass surface through controlling the glass surface hydrofluoric acid etching process using the patterned poly（vinyl alcohol）（PVA） film. The electrohydrodynamic （EHD） technique was adopted to fabricate the cylindrical microstructures on the surface of the PVA film spin?coated on the glass surface. Followed by the hydrofluoric acid etching process， various primary microstructures were fabricated on the glass surface to tune the optical properties. The results indicated that the changes in the EHD induced voltage and the initial thickness of the PVA film could lead to differentiated cylindrical micropatterns on the PVA film. Furthermore， the changes in the etching time and concentration of hydrofluoric acid could lead to a variety of columnar microstructures on the glass surface， which dominated the optical properties of glass such as haze and transmittance. With the results obtained from this work， the application range of PVA film patterning technology in the manufacture of glass surface microstructures can be greatly expanded.

Key words: poly（vinyl alcohol）, film, electrohydrodynamic, patterning, microstructure, optical property

CLC Number:

TQ325.9

SHA Jin, CHEN Xin, CHEN Dongping, MA Yulu, XIE Linsheng. EHD Induced PVA Film Patterning and Its Applications for Microstructure Fabrication on Glass Substrate Surface[J]. China Plastics, 2021, 35(6): 53-59.

Figures/Tables 6

Fig.1. Schematic of EHD induced PVA film patterning and microstructure fabrication on glass substrate surface

Fig.2. AFM characterizations of surface columnar array microstructures on PVA film fabricated under different induced voltage conditions

Fig.3. AFM characterizations of surface columnar array microstructures on the PVA film fabricated under different film thickness conditions

Fig.4. AFM characterizations of surface columnar array microstructures on the glass substrate after different HF etching time

Fig.5. AFM characterizations of surface columnar microstructures on glass substrate etched by different concentration HF

Fig.6. Optical properties of glass substrates under different EHD process conditions

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